The use of modern ultradeep azimuthal resistivity (UDAR) tools, along with other logging-while-drilling (LWD) sensors, increases horizontal well‑placement efficiency, improving net-to-gross (NTG) and maximizing reservoir contact. The depth of investigation (DOI) of electromagnetic (EM) resistivity-based technologies depends on multiple factors. The performance of EM resistivity tools in very low-resistivity formations has remained a challenge, limiting the signal propagation and, thus, the DOI. The complete paper presents a novel workflow for using EM resistivity-based reservoir-mapping LWD technologies for successful well placement and multilayer mapping in very‑low‑resistivity, low-contrast, and thinly laminated clastic reservoirs.
Introduction
One of the main…